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- W22994144 abstract "Nanoimprint lithography (NIL) is a technology that allows the fabrication of low-cost nanostructure devices at high throughput and accuracy. The most popular NIL method is ultraviolet (UV) nanoimprinting because it is a room-temperature process that does not require a thermal cycle. When demolding, the force required is the result of adhesion and friction between the antisticking layer and the resin, and a high demolding force produces pattern defects. Scanning probe microscopy (SPM) is a useful technique for evaluating the performance at the nanometer scale of both the antisticking layer and the UV-curable resin. In this chapter, we describe the evaluation, using techniques of scanning probe microscopy, of a number of properties of antisticking layers and UV-curable resins used in nanoimprint lithography." @default.
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- W22994144 date "2012-01-01" @default.
- W22994144 modified "2023-10-05" @default.
- W22994144 title "Evaluation of the Nanoimprinting Process Using Scanning Probe Microscopy (SPM)" @default.
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- W22994144 doi "https://doi.org/10.1007/978-3-642-25414-7_18" @default.
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