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- W2302057529 abstract "The dependence of the rate of deposition of silicon dioxide layers on the total pressure in the reactor was established. It was shown that activation of monosilane molecules takes place on collision in the gas phase. A scheme of the processes in the gas phase and on the surface which take place during deposition of the layers is proposed" @default.
- W2302057529 created "2016-06-24" @default.
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- W2302057529 date "1988-05-01" @default.
- W2302057529 modified "2023-09-23" @default.
- W2302057529 title "Monomolecular stages of pyrolysis of the SiH/sub 4/ + N/sub 2/O mixture during deposition of silicon dioxide layers" @default.
- W2302057529 hasPublicationYear "1988" @default.
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