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• W2302599139 abstract "The effective work function (eWF) of Al-doped titanium carbide (TiAlC) metal electrodes prepared by atomic layer deposition shows a strong dependence on the underlying gate dielectrics. The eWF of TiAlC on HfO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> shows a low value of 4.2 eV independent of the deposition temperature and process conditions, whereas that on SiO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> shifted to a midgap value of 4.7 eV, and it was sensitive to the process conditions. The mechanism underlying this TiAlC work function dependence on different gate dielectrics is investigated in detail." @default.
• W2302599139 created "2016-06-24" @default.
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• W2302599139 date "2016-04-01" @default.
• W2302599139 modified "2023-10-06" @default.
• W2302599139 title "The Work Function Behavior of Aluminum-Doped Titanium Carbide Grown by Atomic Layer Deposition" @default.
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• W2302599139 doi "https://doi.org/10.1109/ted.2016.2527688" @default.
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