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- W2310566989 abstract "The research work presented in this thesis includes advanced nanofabrication techniques for patterning periodic complex nanostructures over large areas and with improved throughput, and the applications of novel nanofabrication techniques in nanophotonic devices for light filtering, chemical sensing, etc. Nanoantenna assisted light transmission through subwavelength hole arrays is also studied in the last section of this thesis. The first part of this thesis focuses on the development of advanced nanofabrication techniques to improve the throughput and efficiency of large-area pattern formation and mold/mask making. The advanced nanofabrication techniques introduced in this part can be divided into two categories. One is for patterning periodic complex nanostructures over a large area without using e-beam lithography. A series of fabrication methods are developed to transform basic nanostructures such as grating lines and pillars into various complex patterns, including the fabrication of an array of nano-split-rings by symmetry breaking using oblique evaporation and the fabrication of a nanocheckerboard by XOR Boolean patterning. Moreover, Moire patterns formed when two periodic nanopatterns are overlapped with a controlled rotation angle are also used in tuning the pitch of nanogratings and fabricating spatially varying pseudo-periodic nanostructures. The second category of nanofabrication methods is quantized patterning using nanoimprinted-blanks (QUN) for high-throughput mask/mold fabrication. Both positive-tone and negative-tone QUN have been demonstrated at a 200 nm node size using nanoimprinted tile blanks. Particularly, negative-tone QUN, which utilizes a novel bi-layer tile structure, is demonstrated for the first time to the author's best knowledge. A nanoimprint mold fabricated by QUN is also demonstrated after filling in the gaps on the QUN patterns. Our analysis shows that QUN can achieve a throughput enhancement of 2~3 orders over conventional EBL. The second part of this thesis focuses on device applications and physics study backed by novel nanofabrication techniques. An aluminum nano-grid solar-blind filter working in the deep-UV range is fabricated on a wafer-scale area using nanoimprint lithography. The filter has a transmission peak of 27% at 290 nm wavelength. The rejection ratio between the peak transmission wavelength and visible wavelengths is approximately 20 dB. This filter is promising for compact and low-cost silicon-based solar-blind UV detectors and imaging devices. Then, the design, fabrication and characterization of a plasmonic substrate for surface enhanced Raman spectroscopy (SERS) are introduced. This SERS substrate integrates nanodisk antennas, gold nanoparticles and nanogaps, and a gold hole array backplane in a 3-D vertical cavity structure and is termed “disk-coupled dots-on-pillar antenna array” (D2PA) substrate. Our Raman characterization shows this D2PA substrate has a high and uniform enhancement factor of larger than 109 over a large area. Finally, nanoantenna assisted light transmission through subwavelength metallic hole arrays is studied. We observed that in some cases, holes blocked by metal disks can pass through even more light than open holes do, and this transmission property is very sensitive to the coupling strength between the metal disks and the holes." @default.
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- W2310566989 date "2010-01-01" @default.
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- W2310566989 title "Large-area nanofabrication of complex structures and applications in nanophotonic devices" @default.
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