Matches in SemOpenAlex for { <https://semopenalex.org/work/W2312639364> ?p ?o ?g. }
Showing items 1 to 65 of
65
with 100 items per page.
- W2312639364 endingPage "232" @default.
- W2312639364 startingPage "227" @default.
- W2312639364 abstract "Despite the widening gap between scaled feature sizes and optical exposure wavelengths, integrated circuit transistor density so far has kept pace with Moore’s Law. The absence of viable lens materials for smaller wavelengths precludes exposure wavelengths below 193nm for refractive optical tools. Reflective optical exposure tools using extreme ultraviolet (EUV) light have been under intense development over the past decade but, mainly due to light source power shortfalls, have not yet achieved performance levels needed for high volume production. Alternatives to optical pattern transfer are also under development, including electron beam direct write, and nano-imprint lithography (NIL) systems. Until EUV or an alternative technology meets high-volume production requirements, next-generation integrated circuit process nodes will rely upon 193nm immersion lithography tools augmented with novel optical and process technologies to achieve feature pitches below the single exposure resolution limit. Squeezing more information through the limited spatial bandwidth of 193nm systems imposes limitations on design layout freedoms. Designers can no longer draw arbitrary patterns even when minimum line and space dimension constraints are met. The types of layout restrictions demanded by alternative lithography approaches, and their impact on patterning resolution and noise trade-offs, are explored in the context of evolving IC end-use values, such as density, performance, and power efficiency." @default.
- W2312639364 created "2016-06-24" @default.
- W2312639364 creator A5051015855 @default.
- W2312639364 date "2013-03-08" @default.
- W2312639364 modified "2023-09-25" @default.
- W2312639364 title "(Keynote) Advanced Lithography for Density Scaling" @default.
- W2312639364 doi "https://doi.org/10.1149/05201.0227ecst" @default.
- W2312639364 hasPublicationYear "2013" @default.
- W2312639364 type Work @default.
- W2312639364 sameAs 2312639364 @default.
- W2312639364 citedByCount "1" @default.
- W2312639364 countsByYear W23126393642016 @default.
- W2312639364 crossrefType "journal-article" @default.
- W2312639364 hasAuthorship W2312639364A5051015855 @default.
- W2312639364 hasConcept C105487726 @default.
- W2312639364 hasConcept C120665830 @default.
- W2312639364 hasConcept C121332964 @default.
- W2312639364 hasConcept C151730666 @default.
- W2312639364 hasConcept C162996421 @default.
- W2312639364 hasConcept C171250308 @default.
- W2312639364 hasConcept C192562407 @default.
- W2312639364 hasConcept C204223013 @default.
- W2312639364 hasConcept C2779227376 @default.
- W2312639364 hasConcept C2779343474 @default.
- W2312639364 hasConcept C41008148 @default.
- W2312639364 hasConcept C53524968 @default.
- W2312639364 hasConcept C78371743 @default.
- W2312639364 hasConcept C86803240 @default.
- W2312639364 hasConcept C94263209 @default.
- W2312639364 hasConceptScore W2312639364C105487726 @default.
- W2312639364 hasConceptScore W2312639364C120665830 @default.
- W2312639364 hasConceptScore W2312639364C121332964 @default.
- W2312639364 hasConceptScore W2312639364C151730666 @default.
- W2312639364 hasConceptScore W2312639364C162996421 @default.
- W2312639364 hasConceptScore W2312639364C171250308 @default.
- W2312639364 hasConceptScore W2312639364C192562407 @default.
- W2312639364 hasConceptScore W2312639364C204223013 @default.
- W2312639364 hasConceptScore W2312639364C2779227376 @default.
- W2312639364 hasConceptScore W2312639364C2779343474 @default.
- W2312639364 hasConceptScore W2312639364C41008148 @default.
- W2312639364 hasConceptScore W2312639364C53524968 @default.
- W2312639364 hasConceptScore W2312639364C78371743 @default.
- W2312639364 hasConceptScore W2312639364C86803240 @default.
- W2312639364 hasConceptScore W2312639364C94263209 @default.
- W2312639364 hasIssue "1" @default.
- W2312639364 hasLocation W23126393641 @default.
- W2312639364 hasOpenAccess W2312639364 @default.
- W2312639364 hasPrimaryLocation W23126393641 @default.
- W2312639364 hasRelatedWork W1616196646 @default.
- W2312639364 hasRelatedWork W1982361390 @default.
- W2312639364 hasRelatedWork W2003646440 @default.
- W2312639364 hasRelatedWork W2020297584 @default.
- W2312639364 hasRelatedWork W2020306129 @default.
- W2312639364 hasRelatedWork W2021976088 @default.
- W2312639364 hasRelatedWork W2037365610 @default.
- W2312639364 hasRelatedWork W2050847819 @default.
- W2312639364 hasRelatedWork W2080447637 @default.
- W2312639364 hasRelatedWork W2156443994 @default.
- W2312639364 hasVolume "52" @default.
- W2312639364 isParatext "false" @default.
- W2312639364 isRetracted "false" @default.
- W2312639364 magId "2312639364" @default.
- W2312639364 workType "article" @default.