Matches in SemOpenAlex for { <https://semopenalex.org/work/W2313311258> ?p ?o ?g. }
Showing items 1 to 58 of
58
with 100 items per page.
- W2313311258 abstract "The cleaning of Si wafers due to kHz-frequency ultrasonic treatment in a watercontaining bath is studied. The cleaning stages observed with varying treatment time are discussed. It is found that, during the first 60-90 min, organic hydrocarbon contaminants can be effectively removed from the wafer surface. This is evidenced by the disappearance of organic-related absorption peaks and remarkable shortening of the photovoltage decay transients. At longer times, the subsurface crystalline quality is degraded and the wafer performance gradually deteriorates. The decay curves become double-exponential profiles, developing fast initial decays and longer ones at greater instants, indicative of a subsurface trap generation at this treatment stage. This is accompanied by the broadening of the X-ray rocking curves. The likely origin of the presented effects is discussed. Introduction Cleaning of surfaces in silicon wafers has become one of the most critical operations in device processing technologies. The complete removal of contaminations and the passivation of rechargeable states on the surfaces are very important issues for improving energy conversion efficiency of Si solar cells. Ultrasonic treatment (UST) is a promising tool to clean Si wafers with the benefit of reducing hazardous waste [1, 2]. Since the force imparted by acoustic cavitation and streaming is non-selective, not only contaminants but also wafers can be attacked. It is assumed that a damage threshold for UST energy exists, although the physical mechanism behind the ultrasonic-induced damage is not completely understood. Here, we study an interplay of the surface cleaning and damage effects of Si wafers subjected to a kHz-frequency UST, which is performed in distilled water." @default.
- W2313311258 created "2016-06-24" @default.
- W2313311258 creator A5012147112 @default.
- W2313311258 creator A5035118510 @default.
- W2313311258 creator A5071934931 @default.
- W2313311258 creator A5074419895 @default.
- W2313311258 creator A5088960759 @default.
- W2313311258 date "2011-04-01" @default.
- W2313311258 modified "2023-09-25" @default.
- W2313311258 title "SURFACE DAMAGE EFFECTS IN ULTRASONIC CLEANING OF SILICON WAFERS" @default.
- W2313311258 doi "https://doi.org/10.1142/9789814343909_0100" @default.
- W2313311258 hasPublicationYear "2011" @default.
- W2313311258 type Work @default.
- W2313311258 sameAs 2313311258 @default.
- W2313311258 citedByCount "0" @default.
- W2313311258 crossrefType "proceedings-article" @default.
- W2313311258 hasAuthorship W2313311258A5012147112 @default.
- W2313311258 hasAuthorship W2313311258A5035118510 @default.
- W2313311258 hasAuthorship W2313311258A5071934931 @default.
- W2313311258 hasAuthorship W2313311258A5074419895 @default.
- W2313311258 hasAuthorship W2313311258A5088960759 @default.
- W2313311258 hasConcept C121332964 @default.
- W2313311258 hasConcept C160671074 @default.
- W2313311258 hasConcept C192562407 @default.
- W2313311258 hasConcept C24890656 @default.
- W2313311258 hasConcept C2524010 @default.
- W2313311258 hasConcept C2776799497 @default.
- W2313311258 hasConcept C33923547 @default.
- W2313311258 hasConcept C49040817 @default.
- W2313311258 hasConcept C544956773 @default.
- W2313311258 hasConcept C81288441 @default.
- W2313311258 hasConceptScore W2313311258C121332964 @default.
- W2313311258 hasConceptScore W2313311258C160671074 @default.
- W2313311258 hasConceptScore W2313311258C192562407 @default.
- W2313311258 hasConceptScore W2313311258C24890656 @default.
- W2313311258 hasConceptScore W2313311258C2524010 @default.
- W2313311258 hasConceptScore W2313311258C2776799497 @default.
- W2313311258 hasConceptScore W2313311258C33923547 @default.
- W2313311258 hasConceptScore W2313311258C49040817 @default.
- W2313311258 hasConceptScore W2313311258C544956773 @default.
- W2313311258 hasConceptScore W2313311258C81288441 @default.
- W2313311258 hasLocation W23133112581 @default.
- W2313311258 hasOpenAccess W2313311258 @default.
- W2313311258 hasPrimaryLocation W23133112581 @default.
- W2313311258 hasRelatedWork W1979820811 @default.
- W2313311258 hasRelatedWork W2030000362 @default.
- W2313311258 hasRelatedWork W2066737639 @default.
- W2313311258 hasRelatedWork W2086109245 @default.
- W2313311258 hasRelatedWork W2165159835 @default.
- W2313311258 hasRelatedWork W2312552982 @default.
- W2313311258 hasRelatedWork W2363418929 @default.
- W2313311258 hasRelatedWork W2390504411 @default.
- W2313311258 hasRelatedWork W2902546961 @default.
- W2313311258 hasRelatedWork W3036157976 @default.
- W2313311258 isParatext "false" @default.
- W2313311258 isRetracted "false" @default.
- W2313311258 magId "2313311258" @default.
- W2313311258 workType "article" @default.