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• W2313374461 abstract "Attention to low-temperature processes of metal film deposition is due to the necessity to obtain electrically conducting layers on different surfaces including those containing polymeric regions. The use of a highly volatile precursor, for example Pd(hfa)2, with simultaneous stimulation of its decomposition in the atmosphere of hydrogen using the VUV radiation of excimer lamps with the wavelength 116 to 126 nm allows one to decrease the temperature for the deposition of mirror metal films. In the present work, the composition and morphology of palladium films are examined by means of scanning electron microscopy, ESCA, spectral ellipsometry, depending on the temperature of substrate and precursor, deposition time, flow rates of hydrogen and argon. The nature of the substrate, its activation by VUV radiation allow selective deposition of palladium films on combined substrates (metal - polymer) with a complicated spatial relief." @default.
• W2313374461 created "2016-06-24" @default.
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• W2313374461 date "2019-12-17" @default.
• W2313374461 modified "2023-09-27" @default.
• W2313374461 title "Low-Temperature VUV-Stimulated MO CVD Process of Palladium Layer Deposition" @default.
• W2313374461 doi "https://doi.org/10.1149/1.3207685" @default.
• W2313374461 hasPublicationYear "2019" @default.
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