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- W2314331194 abstract "The thermal-oxidation rate of amorphous Si1-xSnx alloy films was found to be remarkably large at lower temperatures (_??_400°C). The rate in the oxygen atmosphere (760 Torr) was estimated to be more than 20 A/min at 350°C for the film with x0.38. Chemical analysis of the resulting oxide has revealed that the oxidation of tin atoms increases dramatically above 200°C and the oxidation of silicon atoms is enhanced with increase of tin content in the films. The oxidation mechanism seems to be related both to melting of Sn in films and to segregation of Si which results from the formation of polycrystalline β-Sn." @default.
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- W2314331194 date "1986-01-01" @default.
- W2314331194 modified "2023-10-17" @default.
- W2314331194 title "Low-Temperature Oxidation of Si-Sn alloy Films" @default.
- W2314331194 doi "https://doi.org/10.3131/jvsj.29.9_434" @default.
- W2314331194 hasPublicationYear "1986" @default.
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