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• W2314692511 abstract "The implantation formation of InAs nanoclusters in silicon and silica and their modification via irradiation with Xe ions with an energy of 167 MeV and a fluence of 3 × 1014 cm–2 are studied. It is found that post-implantation annealing and irradiation with high-energy ions alter the size and shape of nanoclusters and cause structural transformations within them. The ordering of nanoclusters and their elongation along the trajectory of Xe ions in a SiO2 matrix is observed." @default.
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• W2314692511 date "2016-02-01" @default.
• W2314692511 modified "2023-10-08" @default.
• W2314692511 title "Ion-beam formation and track modification of InAs nanoclusters in silicon and silica" @default.
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• W2314692511 doi "https://doi.org/10.3103/s106287381602012x" @default.
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