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- W2315103675 abstract "Ba-Na-Nb-O thin films were formed on sapphire (1120) substrates by electron cyclotron resonance plasma sputtering by using ring shaped targets. A Ba2NaNb5O15 (BNN) thin film of single phase was obtained at the substrate temperature of 873 K by using the target composition of Ba : Na : Nb = 1.0 : 1.0 : 5.0. The (001) oriented BNN film was successfully obtained at 923 K. The contents of Ba and Nb in the films were independent of substrate temperature in the range between 298 K and 923 K. However, Na content decreased with increasing substrate temperature. Deposition rates of the BNN thin films were estimated to be about 1.0X10-1 nm/s. The absorption edge of the BNN films deposited at 923 K became clear in the vicinity of 300 nm. The transmittance in the wavelength between 700 and 2000 nm have exceedingly by more than 80%. The refractive index of the film was estimated about 2.07 at 627 nm." @default.
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- W2315103675 date "1997-01-01" @default.
- W2315103675 modified "2023-10-05" @default.
- W2315103675 title "Preparation of Ba2NaNb5O15 thin Films by Electron Cyclotron Resonance Plasma Sputter Method and their Properties." @default.
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- W2315103675 doi "https://doi.org/10.2497/jjspm.44.86" @default.
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