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- W2316058218 abstract "A simple procedure to monitor the chemical stoichiometry during the plasma assisted deposition processes is presented. With this technique a better control of the deposition parameters is obtained. A direct observation of some predefined spectral lines allows a predictable layer composition." @default.
- W2316058218 created "2016-06-24" @default.
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- W2316058218 date "2007-01-01" @default.
- W2316058218 modified "2023-09-27" @default.
- W2316058218 title "Stoichiometry Monitor in Plasma Assisted Deposition Using Optical Spectroscopy" @default.
- W2316058218 cites W2012994670 @default.
- W2316058218 doi "https://doi.org/10.1364/oic.2007.thb5" @default.
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