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• W2316402413 abstract "We report a new technique to profile the thermal resistance along a nanowire with a spatial resolution of better than 20 nm. Using this technique, we mapped the thermal conductivity along a Si0.7Ge0.3/NiSi0.7Ge0.3 heterostructured nanowire. We also measured the interfacial thermal resistance (ITR) across the Si/NiSi2 interface embedded in Si/NiSi2 heterostructured nanowires. The ITR does not change even for adjacent interfaces as close as ∼ 50 atomic layers." @default.
• W2316402413 created "2016-06-24" @default.
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• W2316402413 date "2014-01-06" @default.
• W2316402413 modified "2023-10-18" @default.
• W2316402413 title "Profiling Nanowire Thermal Resistance with a Spatial Resolution of Nanometers" @default.
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• W2316402413 doi "https://doi.org/10.1021/nl4041516" @default.
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