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- W2317632783 abstract "Assist features are commonly used in DUV lithography to improve the lithographic process window of isolated features under illumination conditions that enable the printability of dense features. With the introduction of EUV lithography, the interaction between 13.5 nm light and the mask features generates strong mask 3D effects. On wafer, the mask 3D effects manifest as pitch-dependent best focus positions, pattern asymmetries and image contrast loss. To minimize the mask 3D effects, and enhance the lithographic process window, we explore by means of wafer print evaluation the use of assist features with different sizes and placements. The assist features are placed next to isolated features and two bar structures, consistent with theN5 (imec iN7) node dimensions for 0.33NA and we use different types of off-axis illumination . For the generic iN7 structures, wafer imaging will be compared to simulation results and an assessment of optimal assist feature configuration will be made. It is also essential to understand the potential benefit of using assist features and to weigh that benefit against the price of complexity associated with adding sub-resolution features on a production mask. To that end, we include an OPC study that compares a layout treated with assist features, to one without assist features, using full-chip complexity metrics like data size." @default.
- W2317632783 created "2016-06-24" @default.
- W2317632783 creator A5004229374 @default.
- W2317632783 creator A5006734382 @default.
- W2317632783 creator A5010534505 @default.
- W2317632783 creator A5013622895 @default.
- W2317632783 creator A5019657501 @default.
- W2317632783 creator A5029087739 @default.
- W2317632783 creator A5045800538 @default.
- W2317632783 creator A5050136424 @default.
- W2317632783 creator A5050481807 @default.
- W2317632783 creator A5058878125 @default.
- W2317632783 creator A5059513127 @default.
- W2317632783 creator A5069591188 @default.
- W2317632783 creator A5086600538 @default.
- W2317632783 date "2016-03-18" @default.
- W2317632783 modified "2023-10-18" @default.
- W2317632783 title "Assist features: placement, impact, and relevance for EUV imaging" @default.
- W2317632783 doi "https://doi.org/10.1117/12.2220025" @default.
- W2317632783 hasPublicationYear "2016" @default.
- W2317632783 type Work @default.
- W2317632783 sameAs 2317632783 @default.
- W2317632783 citedByCount "4" @default.
- W2317632783 countsByYear W23176327832017 @default.
- W2317632783 countsByYear W23176327832019 @default.
- W2317632783 crossrefType "proceedings-article" @default.
- W2317632783 hasAuthorship W2317632783A5004229374 @default.
- W2317632783 hasAuthorship W2317632783A5006734382 @default.
- W2317632783 hasAuthorship W2317632783A5010534505 @default.
- W2317632783 hasAuthorship W2317632783A5013622895 @default.
- W2317632783 hasAuthorship W2317632783A5019657501 @default.
- W2317632783 hasAuthorship W2317632783A5029087739 @default.
- W2317632783 hasAuthorship W2317632783A5045800538 @default.
- W2317632783 hasAuthorship W2317632783A5050136424 @default.
- W2317632783 hasAuthorship W2317632783A5050481807 @default.
- W2317632783 hasAuthorship W2317632783A5058878125 @default.
- W2317632783 hasAuthorship W2317632783A5059513127 @default.
- W2317632783 hasAuthorship W2317632783A5069591188 @default.
- W2317632783 hasAuthorship W2317632783A5086600538 @default.
- W2317632783 hasConcept C120665830 @default.
- W2317632783 hasConcept C121332964 @default.
- W2317632783 hasConcept C158154518 @default.
- W2317632783 hasConcept C162996421 @default.
- W2317632783 hasConcept C17744445 @default.
- W2317632783 hasConcept C199539241 @default.
- W2317632783 hasConcept C41008148 @default.
- W2317632783 hasConceptScore W2317632783C120665830 @default.
- W2317632783 hasConceptScore W2317632783C121332964 @default.
- W2317632783 hasConceptScore W2317632783C158154518 @default.
- W2317632783 hasConceptScore W2317632783C162996421 @default.
- W2317632783 hasConceptScore W2317632783C17744445 @default.
- W2317632783 hasConceptScore W2317632783C199539241 @default.
- W2317632783 hasConceptScore W2317632783C41008148 @default.
- W2317632783 hasLocation W23176327831 @default.
- W2317632783 hasOpenAccess W2317632783 @default.
- W2317632783 hasPrimaryLocation W23176327831 @default.
- W2317632783 hasRelatedWork W1584628001 @default.
- W2317632783 hasRelatedWork W1843462531 @default.
- W2317632783 hasRelatedWork W1990172504 @default.
- W2317632783 hasRelatedWork W2036641180 @default.
- W2317632783 hasRelatedWork W2106813246 @default.
- W2317632783 hasRelatedWork W2748952813 @default.
- W2317632783 hasRelatedWork W3004035668 @default.
- W2317632783 hasRelatedWork W3105626663 @default.
- W2317632783 hasRelatedWork W91919785 @default.
- W2317632783 hasRelatedWork W1516841646 @default.
- W2317632783 isParatext "false" @default.
- W2317632783 isRetracted "false" @default.
- W2317632783 magId "2317632783" @default.
- W2317632783 workType "article" @default.