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- W2318596828 abstract "The over-etch mechanism in poly-gate etching is investigated. The relationships between the final poly-gate profile and the over-etch process parameters are presented. The oxygen flow and temperature of electrostatic chuck (ESC) both sensitively contribute to the notch of the poly-gate profile. Two corresponding process models are suggested." @default.
- W2318596828 created "2016-06-24" @default.
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- W2318596828 date "2019-12-17" @default.
- W2318596828 modified "2023-10-01" @default.
- W2318596828 title "The Mechanism of Over-Etch in Poly-Gate Etching" @default.
- W2318596828 doi "https://doi.org/10.1149/1.3360704" @default.
- W2318596828 hasPublicationYear "2019" @default.
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