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• W2318850875 abstract "Nitrogen-doped ZnSe layers have been grown using dimethylzinc and H2Se as precursors and N2 or N2+3H2 plasma as a dopant. With decreasing the VI/II flow ratio, N acceptors are incorporated more effectively. In the case of N2 plasma doping, the intensity of N acceptor-bound exciton emission is much higher than that of donor-bound exciton emission, but the layers exhibit n-type conductivity and the free-electron concentration increases with decreasing the VI/ II ratio. In the case of N2+3H2 plasma doping, on the other hand, the layers exhibit high resistivity and, after subsequent rapid thermal annealing at 700°C, some layers show p-type conductivity with hole concentration of∼1×1015 cm-3. This indicates that hydrogen causes not only passivation of the N acceptors but also suppression of the generation of donors. Methyl radicals play an important role in producing donor species. Prior to plasma doping, it is needed to prepare Zn-rich surface without methyl radicals in order to obtain p-type N-doped ZnSe layers." @default.
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• W2318850875 date "1996-01-01" @default.
• W2318850875 modified "2023-09-28" @default.
• W2318850875 title "Metalorganic Chemical Vapor Deposition of Nitrogen-Doped ZnSe/GaAs(100) by Alternate Growth and Plasma Doping." @default.
• W2318850875 doi "https://doi.org/10.1380/jsssj.17.276" @default.
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