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- W2321330278 abstract "TiSiN films containing 3.2%−15.5% Si (molar fraction) were deposited on Si(400) substrates by ion beam sputtering combined with filted cathodic arc system. Xray photoelectron spectroscopy (XPS), energy dispersive spectroscopy (EDS) and Xray diffractometry (XRD) were used to study the microstructure and mechanical properties of TiSiN films. The results suggest that a Ti(Si)N solid solution with facecentered cubic structure and (200) preferred crystalline orientation exist in the films with lower Si content. After saturation of Si, the films form a twophase structure, consisting of Ti(Si)N and amorphous Si3N4. The hardness of films is in the range from 22 GPa to 26 GPa. The friction coefficients maintain at 0.13−0.17 using Si3N4 spheres as couples. The hardness of film with 10.9% Si reaches the maximum value, combined with lower roughness, which results that the friction coefficient and wear rate reaches the" @default.
- W2321330278 created "2016-06-24" @default.
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- W2321330278 date "2012-01-01" @default.
- W2321330278 modified "2023-09-27" @default.
- W2321330278 title "Preparation and mechanical properties of TiSiN nanocomposite films" @default.
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