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- W2322874842 abstract "Noncontact wafer identification suitable for a highly clean LSI fabrication process is described. Noncontact identification is established using a video image processing technique to detect an orientation fiat edge of a wafer and read out a mark scribed parallel to the flat edge. This mark, composed of diffraction grating-like bar code modules, and circular strobo flash lamp illumination are both adopted to obtain a good contrast mark image independent of wafer position and orientation. The image processing presented in this paper demonstrates that the flat edge can effectively be detected by a circular mask search and that the mark brightness change problem due to the different wafer surface condition can be resolved by the floating threshold method. Identification experiments are successfully carried out for wafers of different surface conditions which are either bare or coated with SiO2 film and/or a photoresist." @default.
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- W2322874842 date "1986-01-01" @default.
- W2322874842 modified "2023-09-25" @default.
- W2322874842 title "Noncontact wafer identification." @default.
- W2322874842 doi "https://doi.org/10.2493/jjspe.52.1024" @default.
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