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• W2323824438 abstract "Mg-doped p-type gallium nitride (GaN) layers with doping concentrations in the range from 6.5 × 1016 cm−3 (lightly doped) to 3.8 × 1019 cm−3 (heavily doped) were investigated by Hall-effect measurement for the analysis of hole concentration and mobility. p-GaN was homoepitaxially grown on a GaN free-standing substrate by metalorganic vapor-phase epitaxy. The threading dislocation density of p-GaN was 4 × 106 cm−2 measured by cathodoluminescence mapping. Hall-effect measurements of p-GaN were carried out at a temperature in the range from 130 to 450 K. For the lightly doped p-GaN, the acceptor concentration of 7.0 × 1016 cm−3 and the donor concentration of 3.2 × 1016 cm−3 were obtained, where the compensation ratio was 46%. We also obtained the depth of the Mg acceptor level to be 220 meV. The hole mobilities of 86, 31, 14 cm2 V−1 s−1 at 200, 300, 400 K, respectively, were observed in the lightly doped p-GaN." @default.
• W2323824438 created "2016-06-24" @default.
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• W2323824438 date "2016-09-30" @default.
• W2323824438 modified "2023-09-27" @default.
• W2323824438 title "Retraction: “Hall-effect measurements of metalorganic vapor-phase epitaxy-grown p-type homoepitaxial GaN layers with various Mg concentrations”" @default.
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• W2323824438 doi "https://doi.org/10.7567/jjap.55.119201" @default.
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