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- W2324490346 abstract "Gallium sulfide (GaSx) was synthesized for the first time via atomic layer deposition (ALD), using hexakis(dimethylamido)digallium and hydrogen sulfide. The growth characteristics and surface reaction mechanism for the GaSx ALD were investigated using in situ quartz crystal microbalance, quadrupole mass spectrometry, and Fourier transform infrared spectroscopy measurements. The as-deposited films were analyzed for their surface morphology, elemental stoichiometry, chemical states and stability, and crystallinity, using a variety of characterization techniques. These measurements revealed that the GaSx growth was self-limiting in the temperature range of 125–225 °C and the growth per cycle decreased linearly with increasing temperature, from ∼1.0 A/cycle at 125 °C to ∼0.5 A/cycle at 225 °C. The S/Ga ratio was between 1.0 and 1.2 in the temperature range of 125–200 °C, but decreased to 0.75 at 225 °C. The GaSx films were amorphous and the refractive index increased from ∼1.8 to 2.5 with increasing temperatu..." @default.
- W2324490346 created "2016-06-24" @default.
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- W2324490346 date "2014-01-02" @default.
- W2324490346 modified "2023-10-16" @default.
- W2324490346 title "Atomic Layer Deposition of Gallium Sulfide Films Using Hexakis(dimethylamido)digallium and Hydrogen Sulfide" @default.
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- W2324490346 doi "https://doi.org/10.1021/cm4031057" @default.
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