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• W2327863148 abstract "The development of cluster primary ion sources such as Aun+, Bin+, SF5+, C60+, and Arn+ has been an exciting advancement in SIMS analysis. Relative to atomic primary ion sources, cluster ion sources provide higher secondary ion yields. Furthermore, C60+ and Arn+ impart significantly less chemical damage to the sample thus enabling molecular depth profiling. Molecular depth profiling using cluster primary ion sources is routinely used to characterize a wide range of commercially important materials, including organic light emitting diode, biomaterials and pharmaceuticals, adhesives, and architectural paints and coatings. This paper highlights the application of time of flight secondary ion mass spectrometry (ToF-SIMS) to study contact lenses and acrylic-based paints. In the first application, ToF-SIMS was used to investigate the surface composition of two commercial contact lenses. Lens material I is composed of 2-hydroxy-ethyl methacrylate (HEMA) and glycerol methacrylate while lens material II is composed of HEMA and 2-methacryloxyethyl phosphorylcholine cross-linked with ethyleneglycol dimethacrylate. The ToF-SIMS data confirm the presence of the 2-methacryloxyethyl phosphorylcholine on the surface of lens material II. ToF-SIMS was also used to characterize a HEMA-based contact lens which had been worn for about 4 weeks. The analysis reveals the presence of N-containing species, fatty acids, phosphorylcholine, and dioctyldecyl dimethyl ammonium. Arn+ gas cluster ion beams (GCIB) depth profiling indicates the N-containing species, the fatty acids, and the dioctyldecyl dimethyl ammonium are concentrated at the surface. In the second application, a combination of O2+ and Arn+ GCIB depth profiling was used to study the pigment levels in acrylic-based paints. The O2+ beam was used to profile into the bulk of the dried paint film and Arn+ gas cluster beam was then used to remove the damaged material. ToF-SIMS analysis of the crater bottom reveals differences in pigment levels. The combined O2+ and Arn+ GCIB depth profiling is an effective way of characterizing materials composed of both organic and inorganic components." @default.
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• W2327863148 date "2016-04-06" @default.
• W2327863148 modified "2023-09-25" @default.
• W2327863148 title "Applications of ToF-SIMS for imaging and depth profiling commercial materials" @default.
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• W2327863148 doi "https://doi.org/10.1116/1.4944388" @default.
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