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- W2329849291 abstract "Nanoelectrochemical patterning of 1-hexadecanethiol (HDT) monolayer on Au(111) was realized by thiol-modified conductive atomic force microscopy (AFM) tips in a fashion of mild oxidation of top methyl groups of the monolayers. Pt-coated tips modified by a hydrophobic and appropriate thick monolayer of thiol (e.g., HDT) can significantly increase the bias threshold and extend the bias range suitable for the constructive nanolithography (CNL) in comparison with those tips unmodified or modified by hydrophilic monolayers. Furthermore, the switchover from the CNL to the deep oxidation can be governed by the reductive desorption of thiol monolayers from the tip surface when appropriate thiol-modified tips are used. A hydrophobic HDT/tip can exhibit a CNL bias range with an extent of 5.3 V, much wider than the reported extents of the CNL bias ranges on octadecyl trichlorosilane (OTS)/silicon surfaces by unmodified tips. The resulting CNL patterns were shown to have potential as multifunctional templates by guiding the self-assembly of OTS and the site-defined immobilization of aminopropyltriethoxysilane-modified α-Fe2O3 nanoparticles." @default.
- W2329849291 created "2016-06-24" @default.
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- W2329849291 date "2010-10-27" @default.
- W2329849291 modified "2023-09-24" @default.
- W2329849291 title "Constructive Nanolithography by Chemically Modified Tips: Nanoelectrochemical Patterning on SAMs/Au" @default.
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- W2329849291 doi "https://doi.org/10.1021/jp106296x" @default.
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