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- W2331310204 abstract "Photocatalytic production of hydrogen peroxide (H2O2) on semiconductor catalysts with alcohol as a hydrogen source and molecular oxygen (O2) as an oxygen source is a potential method for safe H2O2 synthesis because the reaction can be carried out without the use of explosive H2/O2 mixed gases. Early reported photocatalytic systems, however, produce H2O2 with significantly low selectivity (∼1%). We found that visible light irradiation (λ > 420 nm) of graphitic carbon nitride (g-C3N4), a polymeric semiconductor, in an alcohol/water mixture with O2 efficiently produces H2O2 with very high selectivity (∼90%). Raman spectroscopy and electron spin resonance analysis revealed that the high H2O2 selectivity is due to the efficient formation of 1,4-endoperoxide species on the g-C3N4 surface. This suppresses one-electron reduction of O2 (superoxide radical formation), resulting in selective promotion of two-electron reduction of O2 (H2O2 formation)." @default.
- W2331310204 created "2016-06-24" @default.
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- W2331310204 date "2014-02-07" @default.
- W2331310204 modified "2023-10-17" @default.
- W2331310204 title "Highly Selective Production of Hydrogen Peroxide on Graphitic Carbon Nitride (g-C<sub>3</sub>N<sub>4</sub>) Photocatalyst Activated by Visible Light" @default.
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- W2331310204 doi "https://doi.org/10.1021/cs401208c" @default.
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