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• W2332367925 abstract "The mechanism of stress relaxation in nanocrystalline Fe-N thin film has been studied. The as-deposited film possesses a strong in-plane compressive stress which relaxes with thermal annealing. Precise diffusion measurements using nuclear resonance reflectivity show that stress relaxation does not involve any long-range diffusion of Fe atoms. Rather, a redistribution of nitrogen atoms at various interstitial sites, as evidenced by conversion electron Mossbauer spectroscopy, is responsible for the relaxation of internal stresses. On the other hand, formation of the ${ensuremath{gamma}}^{ensuremath{'}}$-Fe${}_{4}$N phase at temperatures above 523 K involves long-range rearrangement of Fe atoms. The activation energy for Fe self-diffusion is found to be $0.38ifmmodepmelsetextpmfi{}0.04$ eV." @default.
• W2332367925 created "2016-06-24" @default.
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• W2332367925 date "2012-02-01" @default.
• W2332367925 modified "2023-09-24" @default.
• W2332367925 title "Mechanism of stress relaxation in nanocrystalline Fe-N thin films" @default.
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• W2332367925 doi "https://doi.org/10.1103/physrevb.85.075401" @default.
• W2332367925 hasPublicationYear "2012" @default.
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