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- W2335494077 abstract "This work focuses on the synthesis and characterization of gold films grown via galvanic displacement on Ge(111) substrates. The synthetic approach uses galvanic displacement, a type of electroless deposition that takes place in an efficient manner under aqueous, room temperature conditions. Investigations involving X-ray diffraction (XRD) and transmission electron microscopy (TEM) techniques were performed to study the crystallinity and orientation of the resulting gold-on-germanium films. A profound effect of HF(aq) concentration was noted, and although the SEM images did not show significant differences in the resulting gold films, a host of X-ray diffraction studies demonstrated that higher concentrations of HF(aq) led to epitaxial gold-on-germanium, whereas in the absence of HF(aq), lower degrees of order (fiber texture) resulted. Cross-sectional nanobeam diffraction analyses of the Au−Ge interface confirmed the epitaxial nature of the gold-on-germanium film. This epitaxial behavior can be attributed to the simultaneous etching of the germanium oxides, formed during the galvanic displacement process, in the presence of HF. High-resolution TEM analyses showed the coincident site lattice (CSL) interface of gold-on-germanium, which results in a small 3.8% lattice mismatch due to the coincidence of four gold lattices with three of germanium." @default.
- W2335494077 created "2016-06-24" @default.
- W2335494077 creator A5005799744 @default.
- W2335494077 creator A5012967837 @default.
- W2335494077 date "2010-11-24" @default.
- W2335494077 modified "2023-10-16" @default.
- W2335494077 title "Epitaxial Growth of Nanostructured Gold Films on Germanium via Galvanic Displacement" @default.
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- W2335494077 doi "https://doi.org/10.1021/am100698w" @default.
- W2335494077 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/21105725" @default.
- W2335494077 hasPublicationYear "2010" @default.
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