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- W2340886061 abstract "The effect of copper atoms introduced by hight emperature diffusion on the recombination prop� erties of dislocations and dislocation trails in ptype singlecrystal silicon is studied by the electronbeam� induced current technique. It is shown that, in contrast to dislocations, dislocation trails exhibit an increase in recombination activity after the introduction of copper. Bright contrast appearance in the vicinity of dis� location trails is detected after the diffusion of copper and quenching of the samples. The contrast depends on the defect density in these trails." @default.
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- W2340886061 date "2015-01-01" @default.
- W2340886061 modified "2023-09-27" @default.
- W2340886061 title "Effect of Copper on the Recombination Activity of Extended Defects" @default.
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