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- W2347376453 abstract "Al-doped ZnO(AZO) thin films were prepared by RF magnetic sputtering. The influence of background pressure, sputtering power and deposition time on the optical-electrical properties of AZO films was studied. The results indicate that using the lower background pressure and moderate sputtering power of 500 W, the AZO film is fabricated with the thickness of 500 nm, the conductivity of 5×10-4Ω·cm and the average transmittance in visible light spectrum of 82.7%." @default.
- W2347376453 created "2016-06-24" @default.
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- W2347376453 date "2015-01-01" @default.
- W2347376453 modified "2023-09-25" @default.
- W2347376453 title "Investigation of ZnO∶Al thin films deposited by RF magnetron sputtering" @default.
- W2347376453 hasPublicationYear "2015" @default.
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