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- W2347687079 abstract "Si films with nano-crystalline Si arrays were prepared on anodic aluminium oxide (AAO) templates by plasma enhanced chemical vapor deposition (PECVD). The structure and morphology of the films were investigated using X-ray diffraction spectroscopy, scanning electron microscopy and transmission electron microscopy. It was found that the size of Si grains could be controlled by the pores diameter of alumina substrate. The quality of the Si films with nano-crystalline Si arrays was affected by the dynamic pressure during the deposition. Electron field emission measurement of the films-was carried out with a rather low turn-on voltage of 7 V/μm." @default.
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- W2347687079 date "2007-01-01" @default.
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- W2347687079 title "Preparation of nano-crystalline Si arrays by plasma enhanced CVD using porous alumina templates" @default.
- W2347687079 hasPublicationYear "2007" @default.
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