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- W2348979306 abstract "The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAI film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P-C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10-4 Pa at ambient temperature." @default.
- W2348979306 created "2016-06-24" @default.
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- W2348979306 date "2005-01-01" @default.
- W2348979306 modified "2023-09-28" @default.
- W2348979306 title "The structure and hydrogen storage characteristic of magnetron sputtering Ti-base alloy films" @default.
- W2348979306 hasPublicationYear "2005" @default.
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