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- W2349286069 abstract "TiOx thin films at the conditions of different depositing temperatures were prepared on glass substrates by DC reactive magnetron sputtering.Through testing and analysing on their optoelectronic properties,effects of sputtering temperature on TiOx thin films were discussed.The experiments show that TiOx thin film from low depositing temperature had a loose surface texture of small and particles.Film from high depositing temperature had a fine and compact surface texture and the particles on the glass surface densely reunited.With the depositing temperature getting higher,the sputtering rate become slow down,the sheet resistance decreases and the carrier concentration increases.The higher the depositing temperature,the weaker the transmittance of TiOx thin film in the UV-VIS spectral and the optic gap decrease more narrow." @default.
- W2349286069 created "2016-06-24" @default.
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- W2349286069 date "2010-01-01" @default.
- W2349286069 modified "2023-10-15" @default.
- W2349286069 title "Investigations of Optoelectronic Properties of TiO_x Thin Films on Different Depositing Temperatures by DC Reactive Magnetron Sputtering" @default.
- W2349286069 hasPublicationYear "2010" @default.
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