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- W2349335494 abstract "The influence of borane concentration and heating temperature on the properties of a-Si∶ H thin films deposited by RF plasma enhanced chemical vapor deposition have been studied. Under the optimum conditions p-a-Si∶ H thin films with wide optical bandgap,high conductivity and good microstucture were obtained. As window layers applied in HIT( heterojunction with intrinsic thin layer) solar cells,the conversion efficiency of 14. 28% on N-type Si wafer was achieved by optimizing the thickness of P-layer." @default.
- W2349335494 created "2016-06-24" @default.
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- W2349335494 date "2014-01-01" @default.
- W2349335494 modified "2023-09-24" @default.
- W2349335494 title "Fabrication of P-type a-Si∶ H Thin Films and Its Application in HIT Solar Cells" @default.
- W2349335494 hasPublicationYear "2014" @default.
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