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- W2349968252 abstract "Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current(DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips.The composition,microstructure and mechanical properties were investigated using EDX,XRD,XPS,AFM,nano-indentation and scratch test.The results indicate that the hardness of Ti-Si-N gradually rises with the increasing Si contents in the layer until the peak value of 42 GPa appears corresponding to the Si content of(11.2%).The hardness then decreases with further increasing of the Si content.XRD,XPS,and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites(approximately 8 nm in size) surrounded by amorphous Si_3N_4.The preferential growth of TiN is indicated in the XRD patterns.All the Ti-Si-N films show high adhesive strength indicated by the scratch tests.The strengthening mechanism of such nanocomposite films was also discussed." @default.
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- W2349968252 date "2007-03-01" @default.
- W2349968252 modified "2023-09-27" @default.
- W2349968252 title "The Microstructure and Mechanical Properties of Ti-Si-N Nanocomposite Coating Prepared by DC Magnetron Sputtering" @default.
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