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- W2350173312 abstract "As to methanesulfonic tin plating system in MLCC(Multilayer Ceramic Capacitor) three-layer plating, this paper, studied the influence of enhancing Sn2+concentration, additive concentration and current density of cathode on current efficiency, deposition rate, maximum allowable current density and coating performance. The result showed that after enhancing Sn2+concentration and current density of cathode, the concentration of additive I was increased as Sn2+concentration, additiveⅡ was unchanged, the current density of cathode was going up to 0.3~0.35 A/dm2, then the deposition rate was accelerated, that is to say, the time required for plating the coating of same thickness was reduced to one third of the original process. So that the purpose of cutting down plating production cycle and increasing the utilization rate of production facility was accomplished." @default.
- W2350173312 created "2016-06-24" @default.
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- W2350173312 date "2006-01-01" @default.
- W2350173312 modified "2023-09-24" @default.
- W2350173312 title "Study on Influence of Processing Conditions of Methanesulfonic Tin-plating System on Tin Coating Performance in MLCC Three-Layer Plating (continue)" @default.
- W2350173312 hasPublicationYear "2006" @default.
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