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- W2350307614 abstract "The HfOx thin film with resistive switching behaviors was grown on ITO/Glass substrate by Radio frequency-magnetron sputtering method.The electrical properties and chemical composition of the film were analyzed.The results of Electrical tests indicate that Cu/HfOx/Ti show a clearly bi-polar resistive switching without a forming process is revealed.The memory also performs great reliability,and the high-resistance to low-resistance ratio is greater than 10.XPS analysis shows that film contains large amounts of oxygen vacancies.Cu is not throughout the whole HfOx thin film.The mechanism of resistive switching may be associated with oxygen vacancies." @default.
- W2350307614 created "2016-06-24" @default.
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- W2350307614 date "2012-01-01" @default.
- W2350307614 modified "2023-09-23" @default.
- W2350307614 title "Resistance Switching of HfO_x Film for RRAM Applications" @default.
- W2350307614 hasPublicationYear "2012" @default.
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