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- W2350857105 abstract "TiO_2 films were prepared on glass substrates using a radio frequency(RF) reactive magnetron sputtering facility.A monitoring system was constructed to in-situ measure the deposition rate of TiO_2 film.The influences of RF power,oxygen flow rate and working pressure on the deposition rate of TiO_2 films were studied.Results indicated that the deposition rate monitoring system was responsive to changing film thickness and could efficiently realize real-time monitoring.RF power,oxygen/argon flow ratio and working pressure had significant influences on the deposition rate.Namely,the deposition rate of TiO_2 film increased with increasing RF power in the range of 120 ~ 240 W,and it initially increased but decreased later with increasing oxygen flow in the range of 1 ~ 5 mL/min.Moreover,the deposition rate initially rose slowly with increasing working pressure in the range of 0.3 ~ 0.8 Pa and reached a maximum,and finally it decreased rapidly above the critical working pressure." @default.
- W2350857105 created "2016-06-24" @default.
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- W2350857105 date "2014-01-01" @default.
- W2350857105 modified "2023-09-23" @default.
- W2350857105 title "Influence of Magnetron Sputtering Parameters on Deposition Rate of TiO_2 Films" @default.
- W2350857105 hasPublicationYear "2014" @default.
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