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- W2351424804 abstract "An analytical model which could be used to study the 6H-SiC PMOS device behavior in a wide temperature range has been developed.Modeled are the effects of temperature on the threshold voltage,channel mobility,the body leakage current,and the drain/source sheet resistances as several compensating current elements.It includes the Gauss model of interface traps and the Poole-Frenkel effect in the body.The simulation results showed that the large variation of the threshold voltage causes a huge change in the drain currents;the percent of body leakage current increases with the increase of temperature,which is due to the Poole-Frenkel effect caused by several defects;this current gradually plays a major role in the drain currents of SiC MOSFET." @default.
- W2351424804 created "2016-06-24" @default.
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- W2351424804 date "2007-01-01" @default.
- W2351424804 modified "2023-09-25" @default.
- W2351424804 title "Simulation and Analysis of 6H-SiC PMOS with Temperature Compensation" @default.
- W2351424804 hasPublicationYear "2007" @default.
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