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- W2351805859 abstract "The annealing behaviors of PMOS Dosimeters with various gate biases over a wide temperature range have been investigated. The results show that the temperature and gate bias during annealing are two important factors influenced on the anneal rate and fading of threshold voltage shifts. The higher the temperature during annealing, the faster the anneal rate and the deeper the fading of threshold voltage shift. At same anneal temperature, the anneal rate could be raised, and more fading could be achieved by biased positive voltage than by negative voltage between gate and source. The fastest near 100% and fading near 100% could be obtained with zero bias at 180℃. The experimental results are interpreted by using an combined Anneal model." @default.
- W2351805859 created "2016-06-24" @default.
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- W2351805859 date "2000-01-01" @default.
- W2351805859 modified "2023-09-25" @default.
- W2351805859 title "Annealing Characteristics of PMOS Dosimeters" @default.
- W2351805859 hasPublicationYear "2000" @default.
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