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- W2351810444 abstract "The amorphous Si films were prepared by atmospheric pressure chemical vapor deposition(APCVD) with a gas mixture of silane and ethylene and nitrogen at 620℃.The influence of gas mole ratio R between ethylene and silane on properties of sample films was investigated.The parameters such as bond structures ,optical gap of amorphous Si films are measured by Raman spectroscope,Fourier transform infrared(FTIR)spectroscope and ultraviolet-visible(UV-VIS) spectroscope. The bonds of Si-C are found in amorphous Si films prepared with silane and ethylene and nitrogen by APCVD.the optical gap of films increased with the increase of R in the beginning and then reach maximum at the 0.1 of R,after that the optical gap of films become decreased with the increase of R." @default.
- W2351810444 created "2016-06-24" @default.
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- W2351810444 date "2005-01-01" @default.
- W2351810444 modified "2023-09-23" @default.
- W2351810444 title "Optical Properties of Ethylene-doped Amorphous Si Film Prepared by APCVD" @default.
- W2351810444 hasPublicationYear "2005" @default.
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