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• W2352072563 abstract "Amorphous carbon films deposited on silicon substrate using low pressure plasma chemical vapor deposition(LPP-CVD) techniques. Micro-gear made of amorphous carbon films fabricated on silicon substrate vie the technique of oxygen-reactive ion etching(RIE) under an Al mask. Micro-gear was released from the substrate using HNA solutions and assembled on the axis by handwork. The result of Scanning Electron Microscopy(SEM) measurement show that the micro-gear with smooth surface and vertical sidewall ,the thickness and diameter of the micro-gear is 270 μm and 12 μm." @default.
• W2352072563 created "2016-06-24" @default.
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• W2352072563 date "2006-01-01" @default.
• W2352072563 modified "2023-09-23" @default.
• W2352072563 title "Micro-Gear Fabrication Using Amorphous Carbon Films" @default.
• W2352072563 hasPublicationYear "2006" @default.
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