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- W2352266112 abstract "V2O5/V/V2O5 multi-layer films have been fabricated on Si3N4 substrate via intermittent-oxygen-supply method by radio frequency magnetron sputtering.The impact of annealing condition on the square resistance and temperature coefficient of resistance(TCR) have been studied.The results indicate that after annealing process the square resistance of V2O5/V/V2O5 multi-layer films decreases largely,and the relation between resistance and temperature shows a good linear property,and these films fulfill high TCR and excellent stability.XPS is employed to reveal the details of V and O elements on the surface of V2O5/V/V2O5 multi-layer films.The results indicate that the amount of vanadium ions of different valence states is deeply influenced by the diffusion effect between the layers,and the amount of lower valence states increases with the annealing temperature and annealing time increases,and the adsorption of H2O on the surface is enhanced at the same time.Based on the experimental results,the mechanism of the impact of annealing condition on the electrical property of V2O5/V/V2O5 multi-layer is interpreted according to the diffusion theory." @default.
- W2352266112 created "2016-06-24" @default.
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- W2352266112 date "2010-01-01" @default.
- W2352266112 modified "2023-10-15" @default.
- W2352266112 title "Preparation of V_2O_5/V/V_2O_5 thin film and the impact of annealing conditions on the characteristics" @default.
- W2352266112 hasPublicationYear "2010" @default.
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