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- W2352272726 abstract "GaN thin films were successfully prepared on the Si(111) substrates through ammoniating Ga2O3/Ti thin films deposited by magnetron sputtering.The results of XRD,FTIR,SAED and HRTEM confirm that the as-grown films are single-crystal hexagonal GaN with wurtzite structure.We observed the morphology of GaN nanorods by SEM,we found that the diameter of GaN nanorods between 50 to 150nm." @default.
- W2352272726 created "2016-06-24" @default.
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- W2352272726 date "2007-01-01" @default.
- W2352272726 modified "2023-09-23" @default.
- W2352272726 title "Synthesis of GaN nanowires by ammoniating sputtered Ga_2O_3/Ti films on Si substrates" @default.
- W2352272726 hasPublicationYear "2007" @default.
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