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- W2352499598 abstract "The AlN thin films have been successfully deposition on K9 optical glass by magnetron reactive sputtering in Ar and N2 gas mixtures.The influence of different processing parameters on the deposition rate is investigated.The transmittance of AlN films with different N2 concentration is also discussed.The experiments indicated:The deposition rate depends directly on the sputtering power;while the sputtering power is 1.0 kW,the nitrogen concentration in Ar and N2 gas mixture is controled in 25%~30%,the film deposited at the rate of 39 nm/min has superier gualty of average transmi ttlance 90% in visible spectrum.These films can be used as optical coatings and protective coatings." @default.
- W2352499598 created "2016-06-24" @default.
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- W2352499598 date "2008-01-01" @default.
- W2352499598 modified "2023-09-23" @default.
- W2352499598 title "Deposition of AlN Thin Films by Magnetron Reactive Sputtering" @default.
- W2352499598 hasPublicationYear "2008" @default.
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