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- W2352875143 abstract "In undoped semi-insulting(SI)GaAs crystals grown by LEC method,carbon and boron are two main residual impurities.The impurities influence SI character and performance of production.Based on the analyzing of incorporation and extraction mechanism of carbon and boron impurities in GaAs,adopting the measures of baking heater system,decreasing temperature of boric oxide encapsulated,controlling the water content in the boric oxide and growing crystal in As-rich GaAs melt etc,the control of carbon and boron residual impurity in GaAs crystal was achieved." @default.
- W2352875143 created "2016-06-24" @default.
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- W2352875143 date "2007-01-01" @default.
- W2352875143 modified "2023-09-23" @default.
- W2352875143 title "Carbon and Boron Residual Impurity Concentration Control in GaAs Crystal Grown by LEC" @default.
- W2352875143 hasPublicationYear "2007" @default.
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