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- W2353275265 abstract "The dependence of electrical and optical properties on target material and sputtering conditions have been investigated. Al2O3 were doped with 2% (mass fraction) in the target of ZnO.The film were produced by RF planar magnetron sputtering. The resistivity of the film is 4.5 × 10-3Ωcm,carrier concentration and Hall mobility are 2.8x 1020cm-3 and 15.8cm2/V.s respectively. The optical transmittance is about 80%." @default.
- W2353275265 created "2016-06-24" @default.
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- W2353275265 date "1999-01-01" @default.
- W2353275265 modified "2023-09-25" @default.
- W2353275265 title "PREPARATION AND PROPERTIES OF ZnO TRANSPARENT CONDUCTING FILM" @default.
- W2353275265 hasPublicationYear "1999" @default.
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