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- W2354011607 abstract "The effects of sputtering power of magnetron sputtering process on the preparation of Fe-Ga film were studied.The heat treatment of film was carried out and the hardness of the thin film was measured.The results show that,in the range of 50-100 W,the obtained film thickness increases with the sputtering power increasing.And in 100 W,the film thickness and density are best.After the heat treated,the films become more dense,more uniform.In a certain power range,the film hardness increases with the increase of the sputtering power." @default.
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- W2354011607 date "2013-01-01" @default.
- W2354011607 modified "2023-09-23" @default.
- W2354011607 title "Study on Magnetron Sputtering Preparation for Fe-Ga Film" @default.
- W2354011607 hasPublicationYear "2013" @default.
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