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- W2354710012 abstract "Ferroelectric thin film has wide application in the fields of microelectronics, optoele-ctronics, integrated optics and micro-electrical mechanical system. Pulsed laser deposition shows an unique advantage for the deposition of ferroelectric thin film. The mechanism and characteristics of PLD are discussed. Research statuse of the technical parameters of the pulsed laser deposited ferroelectric films, including substrate temperature, oxygen pressure, target composition and structure, energy density, target-to-substrate distance, buffer layer,and post-annealing processing are reviewed in detail. The future application trend is also prospected." @default.
- W2354710012 created "2016-06-24" @default.
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- W2354710012 date "2007-01-01" @default.
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- W2354710012 title "Research status of the technical parameters of the pulsed laser deposited ferroelectric thin films" @default.
- W2354710012 hasPublicationYear "2007" @default.
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