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- W2354855276 abstract "Magnetic multilayers are often prepared by magnetron sputtering, and Ta is used as the buffer layer. In this study, Ta/NiFe/Ta multilayers were deposited on single-crystal Si substrate. XPS depth profiling and peak decomposition technique was used to study the film. The results show that the high-energy deposited technique resulted in an intermixing at the SiO2/Ta interface due to a thermodynamically favorable reaction: 15 SiO2 + 37 Ta = 6 Ta2O5 + 5 Ta5Si3 . Therefore, the Ta buffer layer thickness used to inducing NiFe (111) texture increase. We can also see from the study that XPS is shown to be a powerful tool in characterizing the chemical states in magnetic multilayers." @default.
- W2354855276 created "2016-06-24" @default.
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- W2354855276 date "2002-01-01" @default.
- W2354855276 modified "2023-09-23" @default.
- W2354855276 title "Study of the SiO_2/Ta Interface in Magnetic Multilayers Prepared byMagnetron Sputtering" @default.
- W2354855276 hasPublicationYear "2002" @default.
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