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- W2355474939 abstract "The ECR plasma enhanced deposition was used to grow GaN film.A high local concentration of reactant was created by a gas-distributor. The ECRcondition was diagnosed. The ion density m, electron temperature Te and ion currentdensity Ji were measured by Langmuir probe and Faraday cup. The growth conditionwas optimized in the light of these parameters. The wurtzite GaN with fine opticalproperty was grown in this condition. The results of AES and XPS showed the film isgrown without excess N vacancy and/or Ga co-deposition. The growth rate, 1m/hr,was achieved which was one-magnitude -order larger than usual ECR deposition." @default.
- W2355474939 created "2016-06-24" @default.
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- W2355474939 date "1999-01-01" @default.
- W2355474939 modified "2023-09-25" @default.
- W2355474939 title "THE INVESTIGATION OF GaN FILM DEPOSITION IN ECR PLASMA" @default.
- W2355474939 hasPublicationYear "1999" @default.
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