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- W2355732938 abstract "(Si/Ge)n thin films with different layers and thickness have been successfully deposited by radio frequency magnetron sputtering method.X-ray diffraction and Raman spectra results showed that(Si/Ge)n films in sputtering state were microcrystalline structure,and the diffusion layers(Si-Ge)were formed in sputtering process.The mutual diffusion and crystallization depended on sputtering time.The FESEM indicated that the films were composed of particle-like cluster,and the interface between the layers was distinct.The UV-vis spectra suggested that the films had wide absorption range in visible range,and the range was enlarged with the increasing of the layer.The increase of Si single-layer film thickness seemed to have little influence on the scope of solar spectrum response." @default.
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- W2355732938 date "2012-01-01" @default.
- W2355732938 modified "2023-09-24" @default.
- W2355732938 title "Design Preparation and Optical Absorbance of (Si/Ge)_n Multi-Layer Film" @default.
- W2355732938 hasPublicationYear "2012" @default.
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