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- W2356833342 abstract "A modeling and optimization based control scheme is proposed to improve the wafer temperature uniformity in MOCVD reactor chamber.A neural network based temperature model is established by modeling the relation between the heating power and the corresponding wafer temperature.Taking the temperature uniformity as the performance index,the heating power ratio is optimized by employing the bionic optimization algorithm and the obtained temperature model.The temperature uniformity control is thus performed in real time by constantly modifying the heating power ratio.Experiments results are presented to show the effectiveness of the proposed scheme." @default.
- W2356833342 created "2016-06-24" @default.
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- W2356833342 date "2013-01-01" @default.
- W2356833342 modified "2023-09-24" @default.
- W2356833342 title "Temperature Uniformity Control in MOCVD based on Modeling and Optimization" @default.
- W2356833342 hasPublicationYear "2013" @default.
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