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- W2357038677 abstract "The principle of atomic layer deposition technique (ALD)comparing with conventional film deposition processes,especially in vacuum originated and deposition mechanism,are discussed. Then,the recent progress in ferroelectric films prepared by ALD is reviewed,and consequential issues met in the research,such as metal precursor,defect and kinetics of surface chemical reaction are also discussed. Finally,the outlook of synthesizing ferroelectric films by ALD is predicted." @default.
- W2357038677 created "2016-06-24" @default.
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- W2357038677 date "2007-01-01" @default.
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- W2357038677 title "Principle and Application of Ferroelectric Films by Atomic Layer Deposition" @default.
- W2357038677 hasPublicationYear "2007" @default.
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